Tetraethyl orthosilicate (TEOS)
It is mainly used in the chemical vapor deposition (CVD) process in the wafer manufacturing process to generate silicon dioxide films. It is an electronic chemical required for the manufacture of semiconductors, discrete devices, and microelectromechanical systems (MEMS). It is a substitute for silane and other flammable silicon sources.
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Details Introduction
1. molecular formula:Yes (C2H5O)4
2. molecular weight:208.33
3. physical and chemical properties
Colorless transparent liquid, melting point -77 ℃, boiling point 169 ℃, density 0.9346 g/mL. It is more stable to the air; slightly soluble in water, slow hydrolysis in pure water; in the presence of acid or alkali can accelerate the hydrolysis.
4. uses
It is mainly used in the chemical vapor deposition (CVD) process in the wafer manufacturing process to generate silicon dioxide films. It is an electronic chemical required for the manufacture of semiconductors, discrete devices, and microelectromechanical systems (MEMS). It is a substitute for silane and other flammable silicon sources.
5. quality indicators
Analysis Project | Technical indicators | Technical indicators |
8N | 9N | |
Purity, min | 99.999999% | 99.9999999% |
Main content, min | 99.99% | 99.99% |
Boron, max | 0.5 ppb | 0.5 ppb |
Cl-,max | 0.5 ppm | 0.05 ppm |
Moisture, max | 5 ppm | 5 ppm |
Ethanol content, max | 3 ppm | 3 ppm |
Number of particles ≥ 0.1 µm,max | 50 p/ml | 50 p/ml |
Number of particles ≥ 0.2 µm,max | 30 p/ml | 10 p/ml |
Number of particles ≥ 0.3 µm,max | 20 p/ml | 7 p/ml |
Number of particles ≥ 0.5 µm,max | 10 p/ml | 5 p/ml |
Number of particles ≥ 1.0 µm,max | 3 p/ml | 1 p/ml |
Chroma, max | It's 10 APHA | It's 10 APHA |
6. packaging
Container: Stainless steel bottle
Outer packing: stainless steel cabinet
Specifications: 2 gallons, 5 gallons (19L), 10 gallons, 1.5L, 3.0L, 200L.
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