Trimethylaluminium (TMA, Electronic Grade)

Trimethylaluminium (TMA, Electronic Grade)

Molecular Formula: Al (CH3)3

Molecular Weight: 72.09

Physical and Chemical Properties:

Colorless, melting point: 15°C， boiling point: 127°C， density:0.74g/ml, being pyrophoric in air, strong reaction with alcohol, acid or water. Mix with aliphatic hydrocarbons or benzoyl at any rate.

Applications:

Used for the deposition of Al2O3 passivation layers by PECVD or ALD in photovoltaic Industry, also used for the deposition of High-k material dielectric films in semiconductor industry, such as Al2O3. An important source of organic metal in manufacturing aluminum-containing semi-conductors( such as AlAs, AIN, AIP， AlSb, AlGaAs, AlInGaAs,AlInGaP, AlGaN, AlInGaN, AllInGaNP) by MOCVD(Metallo Organic Chemical Vapor Deposition).

Specification: